|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 20000 Tons/Year |
NF3 gas refers to nitrogen trifluoride in its gaseous form. Nitrogen trifluoride (NF3) is a colorless, odorless gas at room temperature and is commonly used in various industrial applications. NF3 gas has specific properties and uses, as outlined below:
Properties: NF3 gas is non-flammable and non-toxic. It has a slightly sweet odor at high concentrations, but it is generally odorless. Nitrogen trifluoride has a boiling point of -129 degrees Celsius (-200 degrees Fahrenheit) and exists as a gas at room temperature and pressure.
Uses: NF3 gas finds application in several industries:
Electronics Manufacturing: It is widely used as a cleaning agent in the electronics industry. NF3 gas is effective in removing residues from silicon wafers, chambers, and other electronic components during the manufacturing process.
Plasma Etching: NF3 gas is utilized as a plasma etchant in the semiconductor industry. It selectively removes materials from the surface of silicon wafers and other substrates during the fabrication of integrated circuits and microchips.
Solar Panels: Nitrogen trifluoride is involved in the production of thin-film photovoltaic cells used in solar panels.
Fluorinating Agent: In certain chemical reactions, NF3 gas serves as a fluorinating agent. It can introduce fluorine atoms into organic molecules, enabling the synthesis of specific compounds.
Environmental Impact: It is worth noting that nitrogen trifluoride is a potent greenhouse gas with a high global warming potential. Its long atmospheric lifetime contributes to its potential impact on climate change. As the use of NF3 increases, efforts are being made to monitor and reduce emissions of this gas to mitigate its environmental impact.
When working with NF3 gas, it is crucial to follow appropriate safety measures, including working in well-ventilated areas and using proper protective equipment. Additionally, precautions should be taken to prevent exposure to high concentrations, as NF3 can displace oxygen and lead to asphyxiation in confined spaces.
Considering the potential environmental impact and safety considerations, responsible handling and usage of nitrogen trifluoride gas are essential.
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
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|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 20000 Tons/Year |
NF3 gas refers to nitrogen trifluoride in its gaseous form. Nitrogen trifluoride (NF3) is a colorless, odorless gas at room temperature and is commonly used in various industrial applications. NF3 gas has specific properties and uses, as outlined below:
Properties: NF3 gas is non-flammable and non-toxic. It has a slightly sweet odor at high concentrations, but it is generally odorless. Nitrogen trifluoride has a boiling point of -129 degrees Celsius (-200 degrees Fahrenheit) and exists as a gas at room temperature and pressure.
Uses: NF3 gas finds application in several industries:
Electronics Manufacturing: It is widely used as a cleaning agent in the electronics industry. NF3 gas is effective in removing residues from silicon wafers, chambers, and other electronic components during the manufacturing process.
Plasma Etching: NF3 gas is utilized as a plasma etchant in the semiconductor industry. It selectively removes materials from the surface of silicon wafers and other substrates during the fabrication of integrated circuits and microchips.
Solar Panels: Nitrogen trifluoride is involved in the production of thin-film photovoltaic cells used in solar panels.
Fluorinating Agent: In certain chemical reactions, NF3 gas serves as a fluorinating agent. It can introduce fluorine atoms into organic molecules, enabling the synthesis of specific compounds.
Environmental Impact: It is worth noting that nitrogen trifluoride is a potent greenhouse gas with a high global warming potential. Its long atmospheric lifetime contributes to its potential impact on climate change. As the use of NF3 increases, efforts are being made to monitor and reduce emissions of this gas to mitigate its environmental impact.
When working with NF3 gas, it is crucial to follow appropriate safety measures, including working in well-ventilated areas and using proper protective equipment. Additionally, precautions should be taken to prevent exposure to high concentrations, as NF3 can displace oxygen and lead to asphyxiation in confined spaces.
Considering the potential environmental impact and safety considerations, responsible handling and usage of nitrogen trifluoride gas are essential.
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
